Oxford Instruments, one of the
world’s key manufacturers of plasma etch and deposition systems, is pleased to
announce that it has been chosen by Chalmers University of Technology in
Sweden to supply a FlexAL ALD system for installation in their state of the art
cleanroom. The Oxford Instruments FlexAL systems provide a new range of flexibility and capability in the
engineering of nanoscale structures and devices by offering remote plasma ALD
processes and thermal ALD within a single ALD system.
Atomic layer deposition (ALD) is a
true "nano" technology, allowing ultra-thin films of a few nanometres
to be deposited in a precisely controlled way. The two defining characteristics of ALD -
self-limiting atomic layer-by-layer growth and highly conformal coating - offer
many benefits in semiconductor engineering, MEMS and other nanotechnology
applications. The FlexAL system delivers maximum flexibility in the choice of
materials and precursors- low-temperature processes enabled by plasma ALD; low
damage maintained by the use of remote plasma; and controllable, repeatable
processes via recipe-driven software interface.
Dr Mats Hagberg, Process Equipment Specialist at the Nanofabrication
Laboratory, Chalmers University of Technology in Sweden says, “We have seen an
increased need for very thin, high quality films of precise thickness in our
nanotechnology research. Introducing Atomic Layer Deposition capability to our
process laboratory will make it possible for us to take our terahertz,
microwave, and quantum components research to a new level. FlexAL was
the ALD system on the market that best matched our technical specification.”
Chris Hodson, ALD Product Manager at Oxford Instruments says “The FlexAL
ALD tool offers the ideal platform for research and development into many
new application areas, and has the flexibility to process various materials and
handle a wide range of substrates. Our excellent process applications team and
global service support ensure that our customers are supported in every respect
and can count on their Oxford Instruments systems for maximum uptime and
reliability.”
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