Nanoscale Plasma Processing Workshop at Minatec, Grenoble, France on 18th October 2011

Oxford Instruments is continuing its successful series of workshops with a one day event in Grenoble, France.

This workshop is open to all those people working in industry and academia, with an interest in recent progress in research and development, plus future trends in the fabrication and application of micro & nano structures and devices.

Venue: Minatec, Grenoble, France

Timing: 8.30am – 3.30pm

Presentations, Discussions, and a networking lunch
This one day seminar will focus on latest innovations in MEMS, Ion Beam, Atomic Layer Deposition, Silicon and III-V Etch and more.

Guest speakers

We are delighted that guest speakers, Prof Daniel Alquier, Directeur, LMP, Tours, a speaker from IEMN, Lille and Dr Alex Robinson, University of Birmingham, UK will be speaking.

In addition, experts from Oxford Instruments will speak on latest process and applications developments in a number of plasma processing areas

Programme

- III-V Etching for nanowire applications
- MEMS etch developments
- Recent progress in GaN power rectifier
- InP and GaAs etching developments
- Developments in Ion Beam etch and deposition
- Si etch using PlasmaPro NGP80
- ALD overview: Technology & results
- Plasma sources & developing plasma etch processes

Networking Lunch

For more information or to book a place please click here

There is no charge for this workshop, however advance booking is essential.

(Talks will be in English or French at the speakers' choice)