Following the great success of
their Seminar hosted with the IOS-CAS in Beijing last year attended by over 100
participants, Oxford Instruments will hold a one day Seminar on 19th March in
Shanghai, focussing on Nanoscale Plasma Processing.
This one day event, being held
the day before Semicon China 2012, will feature talks by a number of invited
guest speakers, specialists from China, Taiwan and Europe, in addition to
Process and Applications experts from Oxford Instruments Plasma Technology.
These academic and industrial
experts will discuss topics including Atomic Layer Deposition (ALD),
Photovoltaics (PV), Deep Silicon Etch and Ion Beam technologies during the full
one day programme.
In addition to Oxford Instruments
speakers, talks from guest speakers include:
·
Introduction
to ALD and its applications, including photovoltaics; Prof Erwin Kessels,
University of Eindhoven (TU/e), Netherlands
·
Etch
& deposition process in the OPTO and MEMS application device; Dr. Chu
Ann-Kuo, Professor of Department of Photonics, National Sun Yat-sen University,
Taiwan
·
Infrared
Focal Plane Arrays (IRFPAs) detector for space applications; Dr. Zhenghua YE,
SITP (Shanghai Institute of Technology Physics)
·
Micro/Nano
fabrication and characterization of Si field electron emitters; Guest
Speaker: Dr. Juncong SHE, Sun Yat-Sen University, China
·
ALD
used in the MEMS application; Jerry Wang, Manager of Microsystems Technology
Center, ITRI, Taiwan
Jeffrey Seah, Asia Business
Manager, Oxford Instruments Plasma Technology, who will open the Seminar
comments: “We are anticipating a large audience at this Seminar in Shanghai,
and are extremely honoured that so many distinguished guest speakers have
accepted our invitation to speak about their work in Plasma Processing. Our
Seminars are a great opportunity for the Plasma Processing community to come
together, to share their experiences, and to learn more from leading
international experts in their field.”
Based on the success of the 2011
Seminar in Beijing, Oxford Instruments anticipates a very high level of
interest from both academic and production participants, attracted by such an
interesting programme and prestigious speakers.
The event is free to
attend, but booking is essential via process.news@oxinst.com
or lingling.wang@oxinst.com
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