Representing the most advanced addition to the
Olympus opto-digital range, the new LEXT OLS4100 3D laser
scanning microscope offers a faster and easier approach to optical metrology,
combining optical precision with the intuitive operation of a digital
interface.
The new model builds upon the success of its
predecessor, the LEXT OLS4000, and presents several major benefits over
traditional stylus-based contact approaches to surface inspection, enhancing
both efficiency and accuracy, while avoiding sample damage.
Samples of a large range of sizes are easily
analysed, and navigation around the sample is straightforward even at higher
magnifications, as a wide-field area map display of the sample under low
magnification is always visible. Furthermore, the field of view is now
expanded, with updated image stitching functions. A single image is seamlessly constructed
from many individual captures, which can then be viewed and measured in either
2D or 3D. The boundaries of the stitching area can be automatically detected,
or the exact area can instead be manually specified by tracing around a sample
of any shape.
Image acquisition is faster and more
flexible on the LEXT OLS4100, with a variety of scan modes available. By
automatically adjusting for the Z-axis position, the Smart Scan mode restricts
image acquisition to the focal plane, for rapid scanning in high-resolution 3D
across large areas. Ultra-fast mode is approximately nine times faster than
Fine mode, employed in applications demanding the highest level of precision.
For even faster, targeted acquisition of a specified area, the Band Scan mode
will only scan the user-specified region, instead of the whole
sample.
Imaging through
multiple layers is now possible with the new Multi-Layer mode, which recognises
each separate layer as a distinct focal plane along the Z-axis. Accurate
inspection and measurement of each layer is achieved, even when measuring the
roughness and thickness of multiple transparent layers, for example a
transparent resin layer over a glass substrate.
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